Cleanroom
We operate an ISO-5 class clean room at the institute for the microstructuring of individual chips and wafers up to a size of 76mm (3 inches).
Various systems are available for processing in the cleanroom and neighboring laboratories.
Among others:
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Tool for maskless laser direct writing (375nm) of photoresists.
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Various sputtering systems for the deposition of metals (Nb, Al, Ti, ...) and dielectrics (in particular SiO2).
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High vacuum coating plant (PVD)
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Dry etching system (ICP) based on fluor gases for etching thin films and the actual Si wafers
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chemical-mechanical polishing machine (CMP) for removing and planarizing dielectric layers.
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A wet bench and a fume hood for working with resists and other chemicals
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and a wafer saw
The following tools are available for analysis:
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Optical microscope
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White light interferometer
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profilometer
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Scanning electron microscope
